Title :
UV written 1.5 mu m reflection filters in single mode planar silica guides
Author :
Maxwell, G.D. ; Kashyap, Rekha ; Ainslie, B.J. ; Williams, D.L. ; Armitage, J.R.
Author_Institution :
British Telecom Labs., Ipswich, UK
Abstract :
The authors report for the first time a grating in GeO2-SiO2 planar waveguides formed by exposure to UV radiation. The grating gave a reflectivity of 44% with a bandwidth of 1.1 nm, which indicates an index modulation of at least 2.0*10-4. The waveguide material was made sensitive to the UV radiation by annealing in H2, which significantly enhanced the 240 nm absorption band.
Keywords :
annealing; germanate glasses; holographic gratings; integrated optics; optical filters; optical waveguides; silicon compounds; 1.5 micron; GeO 2-SiO 2; H 2 annealing; UV radiation exposure; UV written; grating; planar silica guides; reactive ion etching; reflection filters; single mode;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19921350
