DocumentCode :
873738
Title :
The \\hbox {Pd/TiO}_{2} / \\hbox {n} -LTPS Thin-Film Schottky Diode on Glass Substrate for Hy
Author :
Chou, Tse-Heng ; Fang, Yean-Kuen ; Chiang, Yen-Ting ; Lin, Kung-Cheng ; Lin, Cheng-I ; Kao, Chyuan-Haur ; Lin, Hsiao-Yi
Author_Institution :
Dept. of Electr. Eng., Nat. Cheng Kung Univ., Tainan
Volume :
29
Issue :
11
fYear :
2008
Firstpage :
1232
Lastpage :
1235
Abstract :
A Pd/TiO2/n-type low-temperature-polysilicon (n-LTPS) MOS thin-film Schottky diode fabricated on a glass substrate for hydrogen sensing is reported. The n-LTPS is an excimer-laser-annealed and PH3 -gas-plasma-treated amorphous-silicon (a-Si) thin film. At room temperature and -2-V bias, the developed MOS Schottky diode exhibited a high signal ratio of 1540 to 50 ppm of hydrogen gas, with a fast response time of 40 s, respectively. The signal ratio is better or comparable with that of other reported MOS-type hydrogen gas sensors prepared on Si or III-V compound substrate. In addition, the signal ratio is 7.6, 14, and 30 times over other interfering gases of C2H5OH, C2H4, and NH3 at room temperature and a concentration of 8000 ppm at -2-V bias, respectively. Thus, the developed MOS Schottky diode shows promise for the future development and commercialization of a low-cost hydrogen sensor.
Keywords :
MIS devices; Schottky diodes; amorphous semiconductors; elemental semiconductors; gas sensors; semiconductor thin films; silicon; Pd-TiO2-Si-SiO2; amorphous-silicon thin film; hydrogen gas; hydrogen sensing; low-temperature-polysilicon MOS thin-film Schottky diode; temperature 293 K to 298 K; time 40 s; voltage -2 V; Amorphous silicon (a-Si); MIS; excimer laser annealing (ELA); low-temperature polysilicon (LTPS); palladium;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2008.2005534
Filename :
4633668
Link To Document :
بازگشت