DocumentCode :
873940
Title :
A study of the correlation between high-frequency noise and phase noise in low-noise silicon-based transistors
Author :
Cibiel, Gilles ; Escotte, Laurent ; Llopis, Olivier
Author_Institution :
Lab. d´´Analyse et d´´Archit. des Systemes du Centre, Nat. de la Recherche Scientifique, Toulouse, France
Volume :
52
Issue :
1
fYear :
2004
Firstpage :
183
Lastpage :
190
Abstract :
The evidence of a predominant contribution of the transistor high-frequency noise in residual phase-noise data is demonstrated. This behavior is observed in devices in which the low-frequency noise contribution has been carefully minimized through an optimized bias network, and at offsets frequency above 10 kHz. The phase-noise behavior is then described through nonlinear noise-figure measurements. These results open the way to phase-noise minimization, with a different approach from the one used in most circuit design tools.
Keywords :
elemental semiconductors; microwave bipolar transistors; microwave oscillators; phase noise; semiconductor device noise; silicon; white noise; Si; additive noise; bipolar transistors; high-frequency noise; low-noise silicon-based transistors; microwave transistors; nonlinear noise-figure approach; optimized bias network; oscillator loop; phase noise; Circuit noise; Cutoff frequency; Hafnium; Low-frequency noise; Microwave devices; Microwave oscillators; Microwave transistors; Noise figure; Phase modulation; Phase noise;
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9480
Type :
jour
DOI :
10.1109/TMTT.2003.821271
Filename :
1262691
Link To Document :
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