Title :
Electrical and structural studies of plasma-polymerized fluorocarbon films
Author :
Amyot, N. ; Klemberg-Sapieha, J.E. ; Wertheimer, M.R. ; Ségui, Y. ; Moisan, M.
Author_Institution :
Dept. of Eng. Phys., Ecole Polytech., Montreal, Que., Canada
fDate :
12/1/1992 12:00:00 AM
Abstract :
Plasma-polymerized fluorocarbon films up to 8 μm in thickness were prepared by high-frequency glow discharge deposition, the purpose being to investigate the materials´ charge storage (electret) properties. Film compositions were characterized by infrared and by X-ray photoelectron spectroscopies. Under `mild´ plasma conditions, materials with high fluorine concentration (F/C<1.9) could be obtained, while films with lower F/C were found to be partially oxidized. Besides surface potential decay rate of corona charged specimens, other electrical measurements performed include those of complex permittivity and of thermally stimulated depolarization. The latter revealed relaxations (designated γ and β) at -80°C and +50°C, attributed to local motions of chain segments and to rotation of carbonyl dipoles, respectively. While fluorine-rich films have low dielectric loss and relatively good charge stability (characteristic charge decay time τ>1700 h), a systematic decrease in τ and increase in tanδ could be observed for specimens with decreasing F/C ratio
Keywords :
dielectric losses; dielectric measurement; dielectric thin films; electrets; insulating coatings; organic insulating materials; plasma deposited coatings; polymer films; 1 to 8 micron; 1700 h; F to C ratio; F/C ratio; HF glow discharge deposition; X-ray photoelectron spectroscopies; charge decay time; charge stability; complex permittivity; corona charged specimens; dielectric loss; electrical measurements; motions of chain segments; plasma-polymerized fluorocarbon films; rotation of carbonyl dipoles; structural studies; surface potential decay rate; thermally stimulated depolarization; thickness; Corona; Dielectric losses; Electrets; Glow discharges; Infrared spectra; Material storage; Plasma materials processing; Plasma properties; Plasma x-ray sources; Spectroscopy;
Journal_Title :
Electrical Insulation, IEEE Transactions on