Title :
WO3 Electrochromic Thin Films Doped With Carbon
Author :
Chao-Te Lee ; Donyau Chiang ; Po-Kai Chiu ; Chun-Ming Chang ; Cheng-Chung Jaing ; Sin-Liang Ou ; Kuo-Sheng Kao
Author_Institution :
Instrum. Technol. Res. Center, Nat. Appl. Res. Laboatories, Hsinchu, Taiwan
Abstract :
(WO3)100-XCX thin films (x=0-9.3 at%) were cosputtered on indium-tin-oxide glass substrate with W and C targets by reactive dc magnetron sputtering at room temperature. The effects of doped C on the microstructure and optical properties of the (WO3)100-XCX thin film were examined by field emission scanning electron microscopy with energy dispersive X-ray spectroscopy, X-ray diffraction, and a spectrophotometer. It was found that all of the as-deposited films were amorphous. The average transmittances of bleaching and colored WO3 film in the 400-700 nm range were 75% and 65.9%, respectively. The variation in average transmittance of the bleaching and colored states of (WO3)90.7C9.3 film was 68.3%. The average transmittance of bleaching (WO3)100-XCX thin films did not vary with C doping. However, the average transmittance of colored (WO3)100-XCX film decreased to <;48% after C doping. In addition, the optical transmittance contrast of (WO3)100-XCX thin films was found to be suitable for blue laser wavelength recording.
Keywords :
X-ray chemical analysis; X-ray diffraction; amorphous state; crystal microstructure; doping; electrochromism; field emission electron microscopy; infrared spectra; optical saturable absorption; scanning electron microscopy; sputter deposition; thin films; tungsten compounds; visible spectra; (WO3)100-XCx; ITO-SiO2; X-ray diffraction; amorphous phase; bleaching; blue laser wavelength recording; colored films; colored states; cosputtering; doping; electrochromic doped thin films; energy dispersive X-ray spectroscopy; field emission scanning electron microscopy; indium-tin-oxide glass substrate; light transmittance; microstructures; optical properties; optical transmittance contrast; reactive dc magnetron sputtering; spectrophotometer; temperature 293 K to 298 K; wavelength 400 nm to 700 nm; Amorphous magnetic materials; Bleaching; Doping; Optical diffraction; Optical films; Optical recording; Sputtering; (WO3)100??XCX thin films; bleaching; optical transmittance contrast; reactive dc magnetron sputtering;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2013.2294867
