DocumentCode :
875759
Title :
Degradation Analysis of Lateral PNP Transistors Exposed to X-Ray Irradiation
Author :
Kato, Masataka ; Nakamura, Tohru ; Toyabe, Toru ; Okabe, Takahiro ; Nagata, Minoru
Author_Institution :
Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo 185 Japan 0423-23-1111
Volume :
31
Issue :
6
fYear :
1984
Firstpage :
1513
Lastpage :
1517
Abstract :
Degraded current gain by X-ray irradiation is analyzed for lateral pnp transistors. The relationship between the total dose of X-ray and the surface recombination velocity is also studied. Surface recombination velocity is evaluated in two regions: the depletion region of the emitter-base junction and the non-depleted charge-neutral region of the base surface. X-ray total dose dependency of surface recombination velocity is experimentally derived as: sdep = 0.33D0.9 for depletion regions, and sSur = 3.8D0.8 for non-depleted surface region in the device structure. A radiation hardened structure with a surface potential barrier for lateral pnp transistors is proposed. The possibility of more than one-order of magnitude improvement in radiation hardness is demonstrated by both simulation and experiments.
Keywords :
Bipolar transistors; Degradation; Density measurement; Diodes; Interface states; Ionizing radiation; Laboratories; Radiation hardening; Velocity measurement; Voltage;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1984.4333540
Filename :
4333540
Link To Document :
بازگشت