DocumentCode :
877225
Title :
Modeling for the 2nd-bit effect of a nitride-based trapping storage flash EEPROM cell under two-bit operation
Author :
Chang, Yao-Wen ; Lu, Tao-Cheng ; Pan, Sam ; Lu, Chih-Yuan
Author_Institution :
Macronix Int. Ltd., Hsinchu, Taiwan
Volume :
25
Issue :
2
fYear :
2004
Firstpage :
95
Lastpage :
97
Abstract :
In this letter, we propose a macromodeling approach for the nitride-based trapping storage Flash EEPROM cell with intriguing 2nd-bit effect. Both unusual ID-VD and ID-VG characteristics of this 2-bit Flash cell can be accurately modeled by the macromodel. It also provides insights into the special device characteristics of the programmed cell. Furthermore, we can use this model to correctly evaluate the read speed degradation resulting from 2nd-bit effect.
Keywords :
flash memories; integrated circuit modelling; nitridation; 2nd-bit effect; NROM; flash EEPROM cell; macromodeling; multiple virtual ground AND; nitride-based trapping storage; programmed cell; read speed degradation; two-bit operation; Degradation; Dielectrics; EPROM; Electron traps; Flash memory; Helium; Nonvolatile memory; Solids; Transconductance; Velocity measurement;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2003.822671
Filename :
1263638
Link To Document :
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