DocumentCode :
877259
Title :
AC behavior of gate-induced floating body effects in ultrathin oxide PD SOI MOSFETs
Author :
Lederer, Dimitri ; Flandre, Denis ; Raskin, Jean-Pierre
Author_Institution :
Microwave Lab., Univ. Catholique de Louvain, Louvain-la-Neuve, Belgium
Volume :
25
Issue :
2
fYear :
2004
Firstpage :
104
Lastpage :
106
Abstract :
In this letter we present for the first time an ac analysis of the gate-induced floating body effects (GIFBE) occurring in ultrathin gate oxide partially depleted (PD) silicon-on-insulator (SOI ) MOSFETs due to tunneling gate current. A simple equivalent circuit is proposed, which indicates that the ac behavior of GIFBE is related to the small-signal voltage variations of the floating body region. It also shows that due to the high impedance seen by the body region toward the external nodes, the GIFBE frequency dependence is characterized by a very low cut off frequency (< a few kilohertz), which is consistent with experimental data and circuit simulations performed with BSIMSOI.
Keywords :
MOSFET; semiconductor thin films; silicon-on-insulator; tunnelling; AC analysis; AC behavior; BSIMSOI; circuit simulations; equivalent circuit; floating body region; gate tunneling; gate-induced floating body effects; impedance; silicon-on-insulator; small-signal voltage; tunneling gate current; ultrathin oxide partially depleted SOI MOSFETs; very low cut off frequency; Body regions; CMOS technology; Electrical resistance measurement; Frequency; MOSFETs; Partial discharges; Performance evaluation; Silicon on insulator technology; Tunneling; Voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2003.822658
Filename :
1263641
Link To Document :
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