DocumentCode
877259
Title
AC behavior of gate-induced floating body effects in ultrathin oxide PD SOI MOSFETs
Author
Lederer, Dimitri ; Flandre, Denis ; Raskin, Jean-Pierre
Author_Institution
Microwave Lab., Univ. Catholique de Louvain, Louvain-la-Neuve, Belgium
Volume
25
Issue
2
fYear
2004
Firstpage
104
Lastpage
106
Abstract
In this letter we present for the first time an ac analysis of the gate-induced floating body effects (GIFBE) occurring in ultrathin gate oxide partially depleted (PD) silicon-on-insulator (SOI ) MOSFETs due to tunneling gate current. A simple equivalent circuit is proposed, which indicates that the ac behavior of GIFBE is related to the small-signal voltage variations of the floating body region. It also shows that due to the high impedance seen by the body region toward the external nodes, the GIFBE frequency dependence is characterized by a very low cut off frequency (< a few kilohertz), which is consistent with experimental data and circuit simulations performed with BSIMSOI.
Keywords
MOSFET; semiconductor thin films; silicon-on-insulator; tunnelling; AC analysis; AC behavior; BSIMSOI; circuit simulations; equivalent circuit; floating body region; gate tunneling; gate-induced floating body effects; impedance; silicon-on-insulator; small-signal voltage; tunneling gate current; ultrathin oxide partially depleted SOI MOSFETs; very low cut off frequency; Body regions; CMOS technology; Electrical resistance measurement; Frequency; MOSFETs; Partial discharges; Performance evaluation; Silicon on insulator technology; Tunneling; Voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2003.822658
Filename
1263641
Link To Document