• DocumentCode
    877259
  • Title

    AC behavior of gate-induced floating body effects in ultrathin oxide PD SOI MOSFETs

  • Author

    Lederer, Dimitri ; Flandre, Denis ; Raskin, Jean-Pierre

  • Author_Institution
    Microwave Lab., Univ. Catholique de Louvain, Louvain-la-Neuve, Belgium
  • Volume
    25
  • Issue
    2
  • fYear
    2004
  • Firstpage
    104
  • Lastpage
    106
  • Abstract
    In this letter we present for the first time an ac analysis of the gate-induced floating body effects (GIFBE) occurring in ultrathin gate oxide partially depleted (PD) silicon-on-insulator (SOI ) MOSFETs due to tunneling gate current. A simple equivalent circuit is proposed, which indicates that the ac behavior of GIFBE is related to the small-signal voltage variations of the floating body region. It also shows that due to the high impedance seen by the body region toward the external nodes, the GIFBE frequency dependence is characterized by a very low cut off frequency (< a few kilohertz), which is consistent with experimental data and circuit simulations performed with BSIMSOI.
  • Keywords
    MOSFET; semiconductor thin films; silicon-on-insulator; tunnelling; AC analysis; AC behavior; BSIMSOI; circuit simulations; equivalent circuit; floating body region; gate tunneling; gate-induced floating body effects; impedance; silicon-on-insulator; small-signal voltage; tunneling gate current; ultrathin oxide partially depleted SOI MOSFETs; very low cut off frequency; Body regions; CMOS technology; Electrical resistance measurement; Frequency; MOSFETs; Partial discharges; Performance evaluation; Silicon on insulator technology; Tunneling; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2003.822658
  • Filename
    1263641