DocumentCode :
877768
Title :
The influence of interface states on incomplete charge transfer in overlapping gate charge-coupled devices
Author :
Mohsen, Amr M. ; McGill, T.C. ; Daimon, Yoshiaki ; Mead, Carver A.
Volume :
8
Issue :
2
fYear :
1973
fDate :
4/1/1973 12:00:00 AM
Firstpage :
125
Lastpage :
138
Abstract :
A simple and accurate model is used to estimate the incomplete charge transfer due to interface states trapping in the overlapping gate charge-coupled devices. It is concluded that trapping in the interface states under the edges of the gates parallel to the active channel limits the performance of the devices at moderate and low frequencies. The influence of the device parameters, dimensions, and clocking waveforms on the signal degradation is discussed. It is shown that increasing the clock voltages, reduces the incomplete charge transfer due to interface state trapping.
Keywords :
Field effect devices; Surface electron states; field effect devices; surface electron states; Charge coupled devices; Charge transfer; Clocks; Degradation; Frequency; Helium; Interface states; Silicon; State estimation; Voltage;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.1973.1050361
Filename :
1050361
Link To Document :
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