DocumentCode :
877845
Title :
The realization of the effect of nonuniform distribution in semiconductor null networks
Author :
Toba, Yoshitomi ; Mano, Kunio
Volume :
8
Issue :
2
fYear :
1973
fDate :
4/1/1973 12:00:00 AM
Firstpage :
182
Lastpage :
184
Abstract :
Uniform and nonuniform distributed semiconductor devices suitable for null networks were experimentally fabricated and the effect of nonuniform distribution was observed. The temperature sensitivities were measured and compensating circuits are given. The devices are of wide application and suitable for integrated circuit fabrication.
Keywords :
Distributed parameter networks; Semiconductor devices; distributed parameter networks; semiconductor devices; Active filters; Circuits; Impurities; Physics; Semiconductor devices; Silicon; System testing; Temperature measurement; Temperature sensors; Threshold voltage;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.1973.1050369
Filename :
1050369
Link To Document :
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