DocumentCode :
88067
Title :
Threshold Voltage Design and Performance Assessment of Hetero-Channel SRAM Cells
Author :
Hu, Vita Pi-Ho ; Fan, Ming-Long ; Su, Pin ; Chuang, Ching-Te
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume :
60
Issue :
1
fYear :
2013
fDate :
Jan. 2013
Firstpage :
147
Lastpage :
152
Abstract :
Optimized threshold voltage (Vt) design to enhance the variation immunity of high-performance (super-threshold) and low-voltage (near-/sub-threshold) 6 T SRAM cells is presented. For low-voltage SRAM cells operating at low Vdd, low-Vt design shows smaller variability, while the design tradeoff between performance and leakage should be considered. For high-performance SRAM cells operating at high Vdd, ultra-thin-body SOI SRAM cells with high-Vt design show smaller variability while sacrificing performance compared with the low-Vt design. Our study indicates that hetero-channel SRAM cells enable high-Vt design and exhibit improved Read/Write stability and performance, and maintain comparable RSNM variations for the high-performance SRAM applications.
Keywords :
SRAM chips; low-power electronics; silicon-on-insulator; Si; hetero-channel SRAM cells; low-voltage 6 T SRAM cells; optimized threshold voltage design; read/write stability; super-threshold 6 T SRAM cells; ultra-thin-body SOI SRAM cells; variation immunity; MOSFETs; Performance evaluation; Stability analysis; Tunneling; Wireless sensor networks; Hetero-channel; SRAM; performance; variability;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2012.2228863
Filename :
6376153
Link To Document :
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