A versatile structure for on-chip extraction of resistance matching properties

Author

Larsen, Frode ; Ismail, Mohammed ; Abel, Christopher

Author_Institution

Ohio State Univ., Columbus, OH, USA

Volume

9

Issue

2

fYear

1996

fDate

5/1/1996 12:00:00 AM

Firstpage

281

Lastpage

285

Abstract

This paper describes a simple test structure to accurately characterize resistance mismatch. The process engineer would use this structure to monitor process variations with respect to contact resistance, spreading resistance, sheet resistance and encroachment, the circuit designer would use the structure to determine the matching properties of the line and how to optimize a resistor layout for matching given a maximum physical size. By direct measurements on the structure, the user will know how well resistors can be matched, and what factors introduce the dominant components of the mismatch

Keywords

analogue integrated circuits; contact resistance; electric resistance measurement; integrated circuit layout; integrated circuit manufacture; integrated circuit measurement; integrated circuit testing; monitoring; resistors; analog IC design; contact resistance; encroachment; onchip extraction; process variations monitoring; resistance matching properties; resistance mismatch; resistor layout optimisation; sheet resistance; spreading resistance; test structure; Contact resistance; Data mining; Electrical resistance measurement; Equations; Ohmic contacts; Process design; Proximity effect; Resistors; Statistical analysis; Testing;

fLanguage

English

Journal_Title

Semiconductor Manufacturing, IEEE Transactions on

Publisher

ieee

ISSN

0894-6507

Type

jour

DOI

10.1109/66.492824

Filename

492824