• DocumentCode
    881086
  • Title

    Mechanisms for the Latchup Window Effect in Integrated Circuits

  • Author

    Johnston, Allan H. ; Baze, M. P.

  • Author_Institution
    Boeing Aerospace Company Seattle, Washington 98124
  • Volume
    32
  • Issue
    6
  • fYear
    1985
  • Firstpage
    4017
  • Lastpage
    4025
  • Abstract
    The latchup window effect has been studied in CMOS and advanced bipolar integrated circuits, using a 1.06 pm laser as a diagnostic tool. An important new finding is the identification of latchup windows in bipolar circuits with oxide-isolated sidewalls. The results show that window behavior is caused by distributed effects rather than the local mechanisms that have been assumed in previous modeling efforts. Lateral substrate currents and distributed resistances in diffused regions and metallization are important in modeling latchup window behavior in MSI devices.
  • Keywords
    Bipolar integrated circuits; CMOS integrated circuits; Laser modes; Manufacturing; Metallization; Optical surface waves; Photoconductivity; Probes; Semiconductor device modeling; Testing;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1985.4334061
  • Filename
    4334061