DocumentCode :
881086
Title :
Mechanisms for the Latchup Window Effect in Integrated Circuits
Author :
Johnston, Allan H. ; Baze, M. P.
Author_Institution :
Boeing Aerospace Company Seattle, Washington 98124
Volume :
32
Issue :
6
fYear :
1985
Firstpage :
4017
Lastpage :
4025
Abstract :
The latchup window effect has been studied in CMOS and advanced bipolar integrated circuits, using a 1.06 pm laser as a diagnostic tool. An important new finding is the identification of latchup windows in bipolar circuits with oxide-isolated sidewalls. The results show that window behavior is caused by distributed effects rather than the local mechanisms that have been assumed in previous modeling efforts. Lateral substrate currents and distributed resistances in diffused regions and metallization are important in modeling latchup window behavior in MSI devices.
Keywords :
Bipolar integrated circuits; CMOS integrated circuits; Laser modes; Manufacturing; Metallization; Optical surface waves; Photoconductivity; Probes; Semiconductor device modeling; Testing;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1985.4334061
Filename :
4334061
Link To Document :
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