DocumentCode
881272
Title
Ion Track Shunt Effects in Multi-Junction Structures
Author
Hauser, J.R. ; Diehl-Nagle, S.E. ; Knudson, A.R. ; Campbell, A.B. ; Stapor, W.J. ; Shapiro, P.
Author_Institution
North Carolina State University Raleigh, NC 27695
Volume
32
Issue
6
fYear
1985
Firstpage
4115
Lastpage
4121
Abstract
Charge collection processes are discussed for heavy ion hits across multiple p-n junctions in bipolar transistor or CMOS structures. The concept of a resistive-like ion track shunt bridging two like conductivity regions is introduced and a first-order-model developed for the charge transported along the ion track shunt. This model is shown to be consistent with charge collection measurements on multi-junction CMOS-like structures. It is found that the charge collection at a given p-n junction is influenced and can even be changed in sign by voltages present at a second p-n junction when the ion track penetrates both junctions. This has important consequences for the design of radiation hard integrated circuits and such ion track shunt effects become more important as device dimensions are scaled to smaller values.
Keywords
CMOS process; Charge measurement; Current measurement; DNA; Doping; Laboratories; P-n junctions; Physics; Semiconductor device modeling; Voltage;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1985.4334078
Filename
4334078
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