• DocumentCode
    881272
  • Title

    Ion Track Shunt Effects in Multi-Junction Structures

  • Author

    Hauser, J.R. ; Diehl-Nagle, S.E. ; Knudson, A.R. ; Campbell, A.B. ; Stapor, W.J. ; Shapiro, P.

  • Author_Institution
    North Carolina State University Raleigh, NC 27695
  • Volume
    32
  • Issue
    6
  • fYear
    1985
  • Firstpage
    4115
  • Lastpage
    4121
  • Abstract
    Charge collection processes are discussed for heavy ion hits across multiple p-n junctions in bipolar transistor or CMOS structures. The concept of a resistive-like ion track shunt bridging two like conductivity regions is introduced and a first-order-model developed for the charge transported along the ion track shunt. This model is shown to be consistent with charge collection measurements on multi-junction CMOS-like structures. It is found that the charge collection at a given p-n junction is influenced and can even be changed in sign by voltages present at a second p-n junction when the ion track penetrates both junctions. This has important consequences for the design of radiation hard integrated circuits and such ion track shunt effects become more important as device dimensions are scaled to smaller values.
  • Keywords
    CMOS process; Charge measurement; Current measurement; DNA; Doping; Laboratories; P-n junctions; Physics; Semiconductor device modeling; Voltage;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1985.4334078
  • Filename
    4334078