DocumentCode
881479
Title
The influence of bulk traps on the charge-transfer inefficiency of bulk charge-coupled devices
Author
Collet, M.G.
Volume
11
Issue
1
fYear
1976
fDate
2/1/1976 12:00:00 AM
Firstpage
156
Lastpage
159
Abstract
One of the possible causes of a finite charge-transfer inefficiency in bulk charge-coupled devices (BCCD´s) is the presence of bulk traps in the n-type silicon layer through which the charge packets are transferred. To determine the relative importance of the contribution of traps, the author measured charge transfer inefficiency as a function of temperature. In most of the devices investigated, this measurement results in two broad peaks due to the presence of traps at 0.25 and 0.54 eV below the conduction band edge. The concentration of these traps varied from batch to batch between values of 5×10/SUP 10/ cm/SUP -3/ and 1×10/SUP 12/ cm/SUP -3/.
Keywords
Charge-coupled devices; Electron traps; charge-coupled devices; electron traps; Charge carrier processes; Charge measurement; Current measurement; Density measurement; Electron emission; Electron traps; Energy measurement; Energy states; Frequency; Temperature;
fLanguage
English
Journal_Title
Solid-State Circuits, IEEE Journal of
Publisher
ieee
ISSN
0018-9200
Type
jour
DOI
10.1109/JSSC.1976.1050691
Filename
1050691
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