• DocumentCode
    881690
  • Title

    Novel sub-100 nm thin film transistors

  • Author

    Franssila, S. ; Paloheimo, J. ; Kuivalainen, P.

  • Author_Institution
    Tech. Res. Centre of Finland, Espoo, Finland
  • Volume
    29
  • Issue
    8
  • fYear
    1993
  • fDate
    4/15/1993 12:00:00 AM
  • Firstpage
    713
  • Lastpage
    714
  • Abstract
    A new method is introduced for fabricating metal electrodes for thin film field-effect transistors having a source to drain distance in the sub-100 nm range. The method is based on a liftoff process with sidewall spacers and it is demonstrated by fabricating sub-100 nm polymer transistors. These are to the authors´ knowledge the smallest polymer transistors reported.
  • Keywords
    field effect transistors; metallisation; photolithography; polymer films; thin film transistors; 1 to 100 micron; FET; MOSFET; TFT; field-effect transistors; liftoff process; metal electrodes; polymer transistors; sidewall spacers; thin film transistors;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19930477
  • Filename
    209970