DocumentCode :
882012
Title :
Field dependence of ionisation rates of electrons in silicon
Author :
Ahmad, Sahar
Volume :
5
Issue :
21
fYear :
1969
Firstpage :
536
Lastpage :
537
Abstract :
A theoretical model for the ionisation coefficient of electrons in silicon has been developed based on the solution of the Boltzmann transport equation. Analytic expressions are obtained for the ionisation coefficient and the drift velocity. Modifications in the deformation potential constants have been suggested for obtaining a fit to the experimentally observed results for the drift velocity and ionisation coefficient. The mean free path for ionisation calculated with the help of this model fits well with the earlier predictions.
Keywords :
electron ionisation; elemental semiconductors; high field effects; semiconductor materials; silicon;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19690402
Filename :
4210621
Link To Document :
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