DocumentCode :
882042
Title :
A macroscopic physical model and capacitive response of the buried oxide having a transition layer in a SIMOX substrate
Author :
Omura, Yasuhisa ; Izumi, Katsutoshi
Author_Institution :
NTT LSI Labs., Atsugi, Japan
Volume :
39
Issue :
8
fYear :
1992
fDate :
8/1/1992 12:00:00 AM
Firstpage :
1916
Lastpage :
1921
Abstract :
This paper proposes a macroscopic physical model for the buried oxide having a transition layer in a SIMOX substrate to estimate the parasitic capacitance. The Clausius-Mossotti relationship for two media is introduced into the model, employing an empirical factor to match with a high-frequency response. Peaks in the capacitance dependence on frequency appear only in devices with the buried oxide having a transition layer. This property can be explained by the proposed model. It is also shown that the transition layer adjacent to buried oxide should be eliminated to reduce parasitic capacitance
Keywords :
capacitance; insulated gate field effect transistors; semiconductor device models; semiconductor-insulator boundaries; substrates; Clausius-Mossotti relationship; SIMOX substrate; SOI MOSFET; Si-SiO2; Si:O; buried oxide; capacitive response; high-frequency response; macroscopic physical model; parasitic capacitance; transition layer; Annealing; Density functional theory; Dielectric constant; Dielectric materials; Frequency; Large scale integration; Microscopy; Parasitic capacitance; Silicon; Substrates;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.144684
Filename :
144684
Link To Document :
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