• DocumentCode
    882042
  • Title

    A macroscopic physical model and capacitive response of the buried oxide having a transition layer in a SIMOX substrate

  • Author

    Omura, Yasuhisa ; Izumi, Katsutoshi

  • Author_Institution
    NTT LSI Labs., Atsugi, Japan
  • Volume
    39
  • Issue
    8
  • fYear
    1992
  • fDate
    8/1/1992 12:00:00 AM
  • Firstpage
    1916
  • Lastpage
    1921
  • Abstract
    This paper proposes a macroscopic physical model for the buried oxide having a transition layer in a SIMOX substrate to estimate the parasitic capacitance. The Clausius-Mossotti relationship for two media is introduced into the model, employing an empirical factor to match with a high-frequency response. Peaks in the capacitance dependence on frequency appear only in devices with the buried oxide having a transition layer. This property can be explained by the proposed model. It is also shown that the transition layer adjacent to buried oxide should be eliminated to reduce parasitic capacitance
  • Keywords
    capacitance; insulated gate field effect transistors; semiconductor device models; semiconductor-insulator boundaries; substrates; Clausius-Mossotti relationship; SIMOX substrate; SOI MOSFET; Si-SiO2; Si:O; buried oxide; capacitive response; high-frequency response; macroscopic physical model; parasitic capacitance; transition layer; Annealing; Density functional theory; Dielectric constant; Dielectric materials; Frequency; Large scale integration; Microscopy; Parasitic capacitance; Silicon; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.144684
  • Filename
    144684