DocumentCode
882042
Title
A macroscopic physical model and capacitive response of the buried oxide having a transition layer in a SIMOX substrate
Author
Omura, Yasuhisa ; Izumi, Katsutoshi
Author_Institution
NTT LSI Labs., Atsugi, Japan
Volume
39
Issue
8
fYear
1992
fDate
8/1/1992 12:00:00 AM
Firstpage
1916
Lastpage
1921
Abstract
This paper proposes a macroscopic physical model for the buried oxide having a transition layer in a SIMOX substrate to estimate the parasitic capacitance. The Clausius-Mossotti relationship for two media is introduced into the model, employing an empirical factor to match with a high-frequency response. Peaks in the capacitance dependence on frequency appear only in devices with the buried oxide having a transition layer. This property can be explained by the proposed model. It is also shown that the transition layer adjacent to buried oxide should be eliminated to reduce parasitic capacitance
Keywords
capacitance; insulated gate field effect transistors; semiconductor device models; semiconductor-insulator boundaries; substrates; Clausius-Mossotti relationship; SIMOX substrate; SOI MOSFET; Si-SiO2; Si:O; buried oxide; capacitive response; high-frequency response; macroscopic physical model; parasitic capacitance; transition layer; Annealing; Density functional theory; Dielectric constant; Dielectric materials; Frequency; Large scale integration; Microscopy; Parasitic capacitance; Silicon; Substrates;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.144684
Filename
144684
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