• DocumentCode
    88208
  • Title

    Increasing Capacitance and Self-Resonant Frequency of the MEMS Switched Capacitor Using High- \\kappa TiO2 and SU-8 Bridged Beam Structure

  • Author

    Seon-Jin Choi ; Chang-Hoon Han ; Hyun-Ho Yang ; Dong-Hoon Choi ; Jun-Bo Yoon

  • Author_Institution
    Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
  • Volume
    24
  • Issue
    4
  • fYear
    2015
  • fDate
    Aug. 2015
  • Firstpage
    1006
  • Lastpage
    1015
  • Abstract
    In order to increase two important factors of capacitance and self-resonant frequency (SRF) of the microelectromechanical systems (MEMS)-switched capacitor, we developed a room-temperature-grown high-κ TiO2 dielectric layer in the metal-insulator-metal (MIM) capacitor and an SU-8 bridged beam structure in the MEMS switch. The high-κ TiO2 dielectric layer, which has a relative dielectric constant of up to 32, was utilized to minimize the MIM capacitors´ sizes while maintaining their high capacitance values. In addition, the SU-8 bridged beam structure of the MEMS switch, whose radio frequency (RF) signal interconnecting part is electrically isolated from the switching mechanism, was introduced to shorten the RF signal path. Because of the high-κ dielectric and the bridged beam structure, we have achieved a very high capacitance of up to 14.3 pF with an SRF of 1.8 GHz (the MIM capacitor size was 50 μm × 1200 μm). The same-sized MIM capacitor with a conventional Si3N4 dielectric layer and a conventional cantilever beam-switched capacitor showed only 4.9 pF with an SRF of 2.8 GHz. In a similar capacitance value, the proposed switched capacitor showed 22% increase in SRF (7.1 GHz at 0.92 pF) compared with the conventional cantilever beam switched capacitor with a Si3N4 dielectric layer (5.8 GHz at 1.01 pF). The high SRF was attributed to the short RF signal path and the minimized capacitor size, thereby reducing parasitic inductance.
  • Keywords
    MIM devices; cantilevers; capacitors; high-k dielectric thin films; micromechanical devices; silicon compounds; titanium compounds; MEMS switched capacitor; MIM capacitor; RF signal path; SU-8 bridged beam structure; Si3N4; TiO2; cantilever beam-switched capacitor; capacitance 0.92 pF; capacitance 1.01 pF; capacitance 4.9 pF; frequency 2.8 GHz; frequency 5.8 GHz; frequency 7.1 GHz; metal-insulator-metal capacitor; microelectromechanical systems-switched capacitor; parasitic inductance; radio frequency signal interconnecting part; relative dielectric constant; room-temperature-grown high-κ dielectric layer; self-resonant frequency; Capacitance; Capacitors; MIM capacitors; Microswitches; Structural beams; SU-8 bridged beam; SU-8 bridged beam.; high- $kappa $; high-κ; metal-insulator-metal (MIM) capacitor; metal-insulatormetal (MIM) capacitor; radio frequency microelectromechanical systems (RF MEMS); self-resonant frequency (SRF); switched capacitor;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/JMEMS.2014.2373493
  • Filename
    6982219