DocumentCode :
883424
Title :
Advanced electrical-level modeling of EEPROM cells
Author :
Lanzoni, Massimo ; Suñé, Jordi ; Olivo, Piero ; Riccò, Bruno
Author_Institution :
DEIS, Bologna Univ., Italy
Volume :
40
Issue :
5
fYear :
1993
fDate :
5/1/1993 12:00:00 AM
Firstpage :
951
Lastpage :
957
Abstract :
Conventional modeling of floating-gate electrically erasable programmable read-only memory (EEPROM) cells is shown to be inadequate to correctly evaluate the tunnel current flowing through the MOS injector during programming, essentially because of relevant quantum phenomena taking place at the cathode semiconductor-oxide interface. An electrical-level model incorporating numerical analysis of such effects is developed and discussed. The model is validated by comparing results of the simulations with experimental data obtained with EEPROM cells. The model of the MOS injector has been implemented in the circuit simulator SPICE
Keywords :
EPROM; PLD programming; SPICE; metal-insulator-semiconductor devices; semiconductor device models; tunnelling; EEPROM cells; FLOTOX cell; MOS capacitors; MOS injector; SPICE; cathode semiconductor-oxide interface; electrical-level modeling; erasable programmable read-only memory; floating-gate electrically; numerical analysis; programming; quantum phenomena; simulations; tunnel current; Cathodes; Circuit simulation; EPROM; Electrons; Nonvolatile memory; Numerical analysis; PROM; SPICE; Threshold voltage; Tunneling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.210204
Filename :
210204
Link To Document :
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