DocumentCode :
884573
Title :
A Variation-Tolerant Sub-200 mV 6-T Subthreshold SRAM
Author :
Zhai, Bo ; Hanson, Scott ; Blaauw, David ; Sylvester, Dennis
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI
Volume :
43
Issue :
10
fYear :
2008
Firstpage :
2338
Lastpage :
2348
Abstract :
In this paper, we present a deep subthreshold 6-T SRAM, which was fabricated in an industrial 0.13 mum CMOS technology. We first use detailed simulations to explore the challenges of ultra-low-voltage memory design with a specific emphasis on the implications of variability. We then propose a single-ended 6-T SRAM design with a gated-feedback write-assist that remains robust deep in the subthreshold regime. Measurements of a test chip show that the proposed memory architecture functions from 1.2 V down to 193 mV and provides a 36% improvement in energy consumption over the previously proposed multiplexer-based subthreshold SRAM designs while using only half the area. Adjustable footers and headers are introduced, as well as body bias techniques to extend voltage scaling limits.
Keywords :
CMOS memory circuits; SRAM chips; electronics industry; integrated circuit design; integrated circuit measurement; adjustable footers; adjustable headers; body bias techniques; gated-feedback write-assist technique; industrial CMOS technology; memory architecture functions; single-ended 6-T SRAM design; size 0.13 mum; test chip measurements; ultra-low-voltage memory design; variation-tolerant SRAM fabrication; voltage 200 mV; voltage scaling limits; Area measurement; CMOS technology; Energy consumption; Energy measurement; Memory architecture; Random access memory; Robustness; Semiconductor device measurement; Testing; Textile industry; Low voltage; subthreshold; variation-tolerant SRAM;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.2008.2001903
Filename :
4639539
Link To Document :
بازگشت