DocumentCode :
885941
Title :
Submicron channel MOSFET´s logic under punchthrough
Author :
Nakamura, Tetsuo ; Yamamoto, Minoru ; Ishikawa, Hajime ; Shinoda, Masaichi
Volume :
13
Issue :
5
fYear :
1978
fDate :
10/1/1978 12:00:00 AM
Firstpage :
572
Lastpage :
577
Abstract :
The characteristics of n-channel MOSFETs that make use of the punchthrough current are considered in this paper. The current conduction mechanisms of the short channel MOSFET under the bias condition of punchthrough have been studied through the use of two-dimensional computer simulation. Experimental devices with channel lengths as short as 0.5 μm were fabricated on a lightly doped substrate. Current-voltage curves of these devices showed pentode-like characteristics for smaller drain biases and triode-like characteristics for larger drain biases. A switching delay as small as 75 ps was obtained for a 13-stage ring oscillator composed of the submicron channel devices.
Keywords :
Field effect integrated circuits; Insulated gate field effect transistors; Integrated circuit technology; Integrated logic circuits; Large scale integration; field effect integrated circuits; insulated gate field effect transistors; integrated circuit technology; integrated logic circuits; large scale integration; Circuit synthesis; Design automation; Electrical engineering; Integrated circuit technology; Laboratories; Logic circuits; MOSFET circuits; Physics; Pipelines; Solid state circuits;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.1978.1051102
Filename :
1051102
Link To Document :
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