Automated malfunction diagnosis of semiconductor fabrication equipment: a plasma etch application

Author

May, Gary S. ; Spanos, Costas J.

Author_Institution

Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA

Volume

6

Issue

1

fYear

1993

fDate

2/1/1993 12:00:00 AM

Firstpage

28

Lastpage

40

Abstract

A general methodology for the automated diagnosis of integrated circuit fabrication equipment is presented. The technique combines the best aspects of quantitative algorithmic diagnosis and qualitative knowledge-based approaches. Evidence from equipment maintenance history, real-time tool data, and incline measurements are integrated using evidential reasoning. This methodology is applied to the identification of faults in the Lam Research Autoetch 490 automated plasma etching system located in the Berkeley Microfabrication Laboratory

Keywords

computerised monitoring; knowledge based systems; process control; production control; semiconductor technology; sputter etching; Berkeley Microfabrication Laboratory; Lam Research Autoetch 490; automated malfunction diagnosis; automated plasma etching system; equipment maintenance history; evidential reasoning; identification of faults; incline measurements; integrated circuit fabrication equipment; plasma etch application; qualitative knowledge-based approaches; quantitative algorithmic diagnosis; real-time tool data; semiconductor fabrication equipment; Circuit faults; Etching; Fabrication; Fault diagnosis; History; Integrated circuit measurements; Laboratories; Plasma applications; Plasma diagnostics; Plasma measurements;

fLanguage

English

Journal_Title

Semiconductor Manufacturing, IEEE Transactions on

Publisher

ieee

ISSN

0894-6507

Type

jour

DOI

10.1109/66.210656

Filename

210656