• DocumentCode
    886773
  • Title

    Analytical models of threshold voltage and breakdown voltage of short-channel MOSFETs derived from two-dimensional analysis

  • Author

    Toyabe, Toru ; Asai, Shojiro

  • Volume
    14
  • Issue
    2
  • fYear
    1979
  • fDate
    4/1/1979 12:00:00 AM
  • Firstpage
    375
  • Lastpage
    383
  • Abstract
    An approximate analytical solution for the surface potential is used to derive the threshold voltage. It is shown that the surface potential depends exponentially on the distance from the drain, and this causes the threshold voltage to decrease exponentially with decreasing channel length. The analytical dependence of threshold voltage on device dimensions, doping, and operating conditions is verified by accurate two-dimensional calculations, and the accuracy of the model is attained by slight modification. The breakdown voltage of a short-channel n-MOSFET is lowered by a positive feedback effect of excess substrate current. From two-dimensional analysis of this mechanism, a simple expression of the breakdown voltage is derived. Using this model, the scaling down of MOSFETs is discussed. The simple models of threshold and breakdown voltage of short-channel MOSFETs are helpful both for circuit-oriented analysis and process diagnosis where statistical use of the model is often needed.
  • Keywords
    Insulated gate field effect transistors; Semiconductor device models; insulated gate field effect transistors; semiconductor device models; Accuracy; Analytical models; Circuit analysis computing; Difference equations; Doping; MOSFET circuits; Numerical analysis; Poisson equations; Semiconductor process modeling; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/JSSC.1979.1051188
  • Filename
    1051188