DocumentCode :
886858
Title :
Total Dose Effects at Low Dose Rates
Author :
Johnston, Allan H. ; Roeske, Stanley B.
Author_Institution :
Boeing Aerospace Company Seattle, WA 98124
Volume :
33
Issue :
6
fYear :
1986
Firstpage :
1487
Lastpage :
1492
Abstract :
The effects of irradiation at very low dose rates are discussed for hardened CMOS devices from two different manufacturers. For some devices, rate effects were important even at dose rates of 0.04 rad(Si)/s, so that even lower dose rates may be required to characterize their behavior for some applications. Modeling approaches for low dose rates are discussed, and linearity of the charge generation processes is shown to be an important factor in modeling. Interface state generation for one process was highly nonlinear, which reduced the impact of annealing and super recovery on device hardness.
Keywords :
Annealing; Circuits; Interface states; Laboratories; Linearity; Manufacturing; Region 1; Region 2; Region 3; Threshold voltage;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1986.4334628
Filename :
4334628
Link To Document :
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