Abstract :
This paper describes some of the recent work in the field of basic technology at VLSI Cooperative Laboratories. In microfabrication technology, a pair of high-speed electron-beam pattern delineators, electron-beam mask inspection, a pair of electron-beam projection systems, an X-ray lithography system, and electron-beam and X-ray resists are described. Thermally induced microdefects in silicon crystal are analyzed. A plasma etching system, basic testing and evacuation, and basic devices are also discussed.
Keywords :
Electron beam lithography; Electron resists; Integrated circuit technology; Integrated circuit testing; Large scale integration; Masks; Sputter etching; Etching; Inspection; Laboratories; Plasma applications; Plasma devices; Plasma x-ray sources; Resists; Silicon; Very large scale integration; X-ray lithography;
