DocumentCode
889273
Title
Electron spin resonance study of radiation-induced points defects in nitrided and reoxidized nitrided oxides
Author
Yount, J.T. ; Lenahan, P.M. ; Dunn, G.J.
Author_Institution
Dept. of Eng. Sci. & Mech., Pennsylvania State Univ., University Park, PA, USA
Volume
39
Issue
6
fYear
1992
fDate
12/1/1992 12:00:00 AM
Firstpage
2211
Lastpage
2219
Abstract
X-ray irradiated oxide, nitrided oxide, and reoxidized nitrided oxide films were studied with electron spin resonance. Nitridation of oxide films reduces the density of radiation-induced E ´ centers and creates bridging nitrogen center precursors, while reoxidation of nitrided oxides increases the number of radiation-induced E ´ centers, reduces the number of bridging nitrogen center precursors, and introduces overcoordinated nitrogen center precursors. Nitridation and reoxidation of these films also change the distribution of the radiation-induced defects. The present evidence supports earlier findings that the bridging nitrogen defect plays an important role in electron trapping in nitrided oxides and that the dominant hole trap in reoxidized nitrided oxides is not the E ´ center. Exposure to molecular hydrogen at room temperature annihilates paramagnetism of the nitrogen-associated centers and reduces that of the E ´ centers
Keywords
X-ray effects; defect electron energy states; dielectric thin films; electron traps; hole traps; metal-insulator-semiconductor devices; nitridation; oxidation; paramagnetic resonance of defects; point defects; silicon compounds; H2 exposure; MOS devices; N centre precursors; ROXNOX; SiOxNy films; X-ray irradiation; electron spin resonance; electron trapping; hole trap; nitridation; nitrided oxide; radiation-induced E´ centers; radiation-induced points defects; reoxidation; reoxidized nitrided oxide films; Atomic measurements; Dielectric thin films; Electron traps; Hydrogen; Nitrogen; Paramagnetic resonance; Rapid thermal processing; Semiconductor films; Silicon compounds; Temperature;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/23.211423
Filename
211423
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