DocumentCode
889330
Title
High mechanical reliability of back-ground GaAs LSI chips with low thermal resistance
Author
Nishiguchi, Masanori ; Miki, Atsushi ; Goto, Noboru ; Fujihira, Mitsuaki ; Nishizawa, Hideaki
Author_Institution
Sumitomo Electr. Ind. Ltd., Yokohama, Japan
Volume
14
Issue
4
fYear
1991
fDate
12/1/1991 12:00:00 AM
Firstpage
848
Lastpage
854
Abstract
GaAs LSI-sized 6.35 mm square chips with mirror ground back surfaces (R max=0.1 μm) have been confirmed to be almost as reliable as chemically thinned ones through fracture stress experiments. Two fracture strength test methods, the four-point bending test and the biaxial tension test, were performed and the data were analyzed based on Weibull statistics. The 1 μm post-grinding chemical etching in the original wafer thinning technology was proven to be effective in eliminating the surface flaws due to grinding, which act as stress concentrators and reduce mechanical strength. The thermal resistance of back-ground 5 mm square GaAs chips was observed to be low by utilizing the surface temperature measurement technology based on the diode drop technique. The thermal resistance was judged to be independent of the back-surface treatment
Keywords
III-V semiconductors; etching; gallium arsenide; large scale integration; reliability; thermal resistance measurement; 6.35 nm; GaAs LSI chips; GaAs chips; Weibull statistics; back-surface treatment; biaxial tension test; chemical etching; four-point bending test; fracture strength test methods; fracture stress experiments; low thermal resistance; mechanical reliability; mirror ground back surfaces; semiconductors; surface flaws elimination; wafer thinning technology; Chemical technology; Gallium arsenide; Large scale integration; Mirrors; Performance evaluation; Stress; Surface cracks; Surface resistance; Testing; Thermal resistance;
fLanguage
English
Journal_Title
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher
ieee
ISSN
0148-6411
Type
jour
DOI
10.1109/33.105144
Filename
105144
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