• DocumentCode
    889502
  • Title

    Single 5-V, 64k RAM with Scaled-Down MOS Structure

  • Author

    Masuda, Hiroo ; Hori, Ryoichi ; Kamigaki, Yoshiaki ; Itoh, Kiyoo

  • Volume
    15
  • Issue
    4
  • fYear
    1980
  • fDate
    8/1/1980 12:00:00 AM
  • Firstpage
    672
  • Lastpage
    677
  • Abstract
    A single 5-V, 64K W was designed and fabricated using double poly-Si and 3-μm process technologies. The design features of this dynamic. RAM are described. In particular, memory-cell layout and the on-chip bias generator are designed to realize a marginal single 5-V RAM. The fabricated device provides a typical access time of 120 ns and an operating power of 170 mW. Extensive measurements of the 64K RAM and studies of scaled devices are presented. In line with these studies, scaling of RAM performances is discussed in terms of a scaled-down process and power-supply voltage.
  • Keywords
    Elemental semiconductors; Field effect integrated circuits; Integrated circuit technology; Integrated memory circuits; Random-access storage; Silicon; Aluminum; Capacitance; DRAM chips; Design engineering; Dynamic voltage scaling; Noise generators; Power engineering and energy; Process design; Random access memory; Read-write memory;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/JSSC.1980.1051454
  • Filename
    1051454