• DocumentCode
    890539
  • Title

    Increase in photosensitivity in silica-based optical waveguides on silicon

  • Author

    Hibino, Y. ; Abe, Makoto ; Yamada, Hiroyoshi ; Ohmori, Yutaka ; Bilodeau, F. ; Malo, B. ; Hill, K.O.

  • Author_Institution
    NTT Optoelectron. Labs., Ibaraki, Japan
  • Volume
    29
  • Issue
    7
  • fYear
    1993
  • fDate
    4/1/1993 12:00:00 AM
  • Firstpage
    621
  • Lastpage
    623
  • Abstract
    An increase in the photoinduced refractive-index change Delta n in GeO2-doped silica optical waveguides on silicon is described. The increase is attained by the consolidation of a core film in a reducing atmosphere. A maximum Delta n of 3.9*10-4 is obtained for the TE mode by UV laser irradiation at 248 nm. This is four times larger than that in conventional waveguides.
  • Keywords
    germanate glasses; integrated optics; optical glass; optical waveguides; photorefractive materials; 248 nm; Si substrate; SiO 2:GeO 2-Si; TE mode; UV laser irradiation; film consolidated in reducing atmosphere; photoinduced refractive-index change; photosensitivity; planar waveguides;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19930416
  • Filename
    211840
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=890539