DocumentCode :
890539
Title :
Increase in photosensitivity in silica-based optical waveguides on silicon
Author :
Hibino, Y. ; Abe, Makoto ; Yamada, Hiroyoshi ; Ohmori, Yutaka ; Bilodeau, F. ; Malo, B. ; Hill, K.O.
Author_Institution :
NTT Optoelectron. Labs., Ibaraki, Japan
Volume :
29
Issue :
7
fYear :
1993
fDate :
4/1/1993 12:00:00 AM
Firstpage :
621
Lastpage :
623
Abstract :
An increase in the photoinduced refractive-index change Delta n in GeO2-doped silica optical waveguides on silicon is described. The increase is attained by the consolidation of a core film in a reducing atmosphere. A maximum Delta n of 3.9*10-4 is obtained for the TE mode by UV laser irradiation at 248 nm. This is four times larger than that in conventional waveguides.
Keywords :
germanate glasses; integrated optics; optical glass; optical waveguides; photorefractive materials; 248 nm; Si substrate; SiO 2:GeO 2-Si; TE mode; UV laser irradiation; film consolidated in reducing atmosphere; photoinduced refractive-index change; photosensitivity; planar waveguides;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19930416
Filename :
211840
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=890539
بازگشت