DocumentCode :
890918
Title :
Intrinsic transconductance extraction for deep-submicrometer MOSFETs
Author :
Chung, J. ; Jeng, M.-C. ; May, G. ; Ko, P.K. ; Hu, C.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
Volume :
36
Issue :
1
fYear :
1989
fDate :
1/1/1989 12:00:00 AM
Firstpage :
140
Lastpage :
142
Abstract :
Significant error in the extracted intrinsic transconductance gmi can arise from source-drain resistance asymmetry. A simple procedure to either correct for or avoid this source of error is outlined. Using deep-submicrometer devices, experimental results that demonstrate the severity of the potential error and to verify the applicability of the proposed technique are presented. A method which extracts the individual values of the source and drain resistances is also described
Keywords :
electric admittance measurement; insulated gate field effect transistors; deep-submicrometer MOSFETs; error; intrinsic transconductance; source-drain resistance asymmetry; Electrical resistance measurement; Equations; Error correction; Fabrication; Forward contracts; MOSFETs; Physics; Temperature; Transconductance; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.21194
Filename :
21194
Link To Document :
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