• DocumentCode
    891163
  • Title

    An 18 ns CMOS/SOS 4K static RAM

  • Author

    Isobe, Mitsuo ; Uchida, Yukimasa ; Maeguchi, Kenji ; Mochizuki, Tohru ; Kimura, Minoru ; Hatano, Hiroshi ; Mizutani, Yoshihisa ; Tango, Hiroyuki

  • Volume
    16
  • Issue
    5
  • fYear
    1981
  • Firstpage
    460
  • Lastpage
    465
  • Abstract
    A high-speed CMOS/SOS 4K word/spl times/1 bit static RAM is described. The RAM features a MoSi/SUB 2/ gate CMOS/SOS technology with 2 /spl mu/m gate length and 500 /spl Aring/ thick gate oxide. Performance advantage of SOS over bulk is discussed for the scaled-down MOS LSI with 1-2 /spl mu/m gate. A standard 6-transistor CMOS cell and a two-stage sense amplifier scheme are utilized. In spite of the rather conservative 3.5 /spl mu/m design rule except for the 2 /spl mu/m gate length, the cell size of 36/spl times/36 /spl mu/m, the die size of 3.11/spl times/4.07 mm, and the typical read access and cycle time of 18 ns are achieved. The active and standby power dissipation are 200 mW and 50 /spl mu/W, respectively.
  • Keywords
    Field effect integrated circuits; Integrated memory circuits; Large scale integration; Random-access storage; field effect integrated circuits; integrated memory circuits; large scale integration; random-access storage; Boron; CMOS technology; Delay; Large scale integration; Leakage current; MOS devices; Parasitic capacitance; Semiconductor films; Silicides; Wiring;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/JSSC.1981.1051623
  • Filename
    1051623