Title :
Refractive variable optical attenuator fabricated by silicon deep reactive ion etching
Author :
Kim, Young Yun ; Yun, Sung Sik ; Park, Chang Soo ; Lee, Jong-Hyun ; Lee, Yeong Gyu ; Lee, Hyun Ki ; Yoon, Sang Ki ; Kang, Jun Seok
Author_Institution :
Korea Aerosp. Res. Inst., Daejon, South Korea
Abstract :
We report on a novel refractive variable optical attenuator with a wedge-shaped silicon optical leaker, in which a part of the light signal is successively transmitted and refracted outside the acceptance angle of the output fiber. This device can be simply fabricated using a deep reactive ion etching and does not require sidewall metallization. We have theoretically estimated its optical characteristics and experimentally showed its high performances, such as low insertion loss of 0.6 dB and wide attenuation range of 43 dB. The fabricated device also showed a high return loss of over 39 dB even in an air-ambient condition and its polarization-dependent loss was smaller than 10% of the attenuation level.
Keywords :
elemental semiconductors; optical attenuators; optical communication equipment; optical fabrication; optical fibre fabrication; optical fibre losses; optical fibre polarisation; optical losses; silicon; sputter etching; 0.6 dB; 39 dB; Si; acceptance angle; air-ambient condition; attenuation level; insertion loss; optical characteristics; output fiber; polarization-dependent loss; refractive variable optical attenuator; return loss; silicon deep reactive ion etching; wedge-shaped silicon optical leaker; Estimation theory; Etching; Metallization; Optical attenuators; Optical fiber devices; Optical fiber polarization; Optical losses; Optical refraction; Particle beam optics; Silicon;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2003.818948