Title :
Planar waveguide echelle gratings in silica-on-silicon
Author :
Janz, S. ; Balakrishnan, A. ; Charbonneau, S. ; Cheben, P. ; Cloutier, M. ; Delâge, A. ; Dossou, K. ; Erickson, L. ; Gao, M. ; Krug, P.A. ; Lamontagne, B. ; Packirisamy, M. ; Pearson, M. ; Xu, D.-X.
Author_Institution :
Nat. Res. Council Canada, Ottawa, Ont., Canada
Abstract :
Silica planar waveguide echelle grating demultiplexers with 48 channels and 256 channels are described and demonstrated. Polarization effects due to stress birefringence and polarization-dependent grating efficiency have been eliminated using a modified polarization compensator and grating design. The devices have a polarization-dependent wavelength shift of less than 10 pm, and a polarization-dependent loss below 0.2 dB. The 48-channel device has a measured crosstalk of -35 dB, an insertion loss better than 4 dB, and a uniformity of 1 dB across the C-band.
Keywords :
birefringence; demultiplexing equipment; diffraction gratings; light polarisation; optical communication equipment; optical crosstalk; optical losses; optical planar waveguides; semiconductor-insulator boundaries; silicon; silicon compounds; wavelength division multiplexing; 48-channel device; C-band; SiO2-Si; crosstalk; insertion loss; modified polarization compensator; planar waveguide echelle gratings; polarization effects; polarization-dependent grating efficiency; polarization-dependent loss; polarization-dependent wavelength shift; silica planar waveguide echelle grating demultiplexers; silica-on-silicon; stress birefringence; Birefringence; Crosstalk; Gratings; Insertion loss; Loss measurement; Planar waveguides; Polarization; Silicon compounds; Stress; Wavelength measurement;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2003.823139
