DocumentCode :
891822
Title :
Charge storage in metal-silicon nitride-silicon capacitors
Author :
Hutchins, C.L. ; Lade, R.W.
Volume :
55
Issue :
8
fYear :
1967
Firstpage :
1494
Lastpage :
1495
Abstract :
Charge storage in MNS capacitors is presented as a function of time with temperature as a parameter. Activation energies for shifts of flat-band voltage are found to be 0.02 eV and 0.1 eV for two samples that have different deposition parameters.
Keywords :
Capacitors; Degradation; Magnetic flux; Pulse measurements; Silicon; Superconducting films; Superconducting magnets; Superconductivity; Transistors; Writing;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/PROC.1967.5861
Filename :
1447791
Link To Document :
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