DocumentCode
892919
Title
Fabrication and characterisation of 200 mm germanium-on-insulator (GeOI) substrates made from bulk germanium
Author
Deguet, C. ; Sanchez, L. ; Akatsu, T. ; Allibert, F. ; Dechamp, J. ; Madeira, F. ; Mazen, F. ; Tauzin, A. ; Loup, V. ; Richtarch, C. ; Mercier, D. ; Signamarcheix, T. ; Letertre, F. ; Depuydt, B. ; Kernevez, N.
Volume
42
Issue
7
fYear
2006
fDate
3/30/2006 12:00:00 AM
Firstpage
415
Lastpage
417
Abstract
The formation and detailed characterisations of a 200 mm germanium-on-insulator substrate made from germanium bulk material as donor wafer using the Smart CutTM technology is reported. Detailed characterisations of final GeOI structures are presented: final roughness, defectivity evaluation, thickness measurement, and electrical characterisation.
Keywords
elemental semiconductors; germanium; semiconductor-insulator boundaries; thickness measurement; 200 mm; Ge; GeOI structures; Smart Cut™ technology; defectivity evaluation; donor wafer; electrical characterisation; final roughness; germanium bulk material; germanium-on-insulator substrates; thickness measurement;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20060208
Filename
1618314
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