Title :
InAs/InGaP/GaAs heterojunction power Schottky rectifiers
Author :
Chen, A. ; Young, M. ; Woodall, J.M.
Author_Institution :
Dept. of Electr. Eng., Yale Univ., New Haven, CT, USA
fDate :
3/30/2006 12:00:00 AM
Abstract :
A low-temperature (LT) grown InAs epi-layer has been applied as the gate to the dual-material structure of lattice-matched InGaP on GaAs, to make a high-temperature power rectifier. The LT molecular beam epitaxy technique enables the formation of an abrupt interface between InAs and InGaP. This heterojunction rectifier utilises the strong thermal stability of the InAs/InGaP heterojunction and the high figure-of-merit of the InGaP/GaAs dual-material structure for power devices. The LT-InAs/InGaP/GaAs heterojunction rectifier demonstrates lower on-state resistance, lower off-state leakage current, and higher breakdown voltage, than metal/GaAs Schottky rectifiers.
Keywords :
III-V semiconductors; Schottky diodes; gallium arsenide; gallium compounds; indium compounds; molecular beam epitaxial growth; power semiconductor diodes; semiconductor epitaxial layers; semiconductor heterojunctions; solid-state rectifiers; thermal stability; InAs-InGaP-GaAs; breakdown voltage; dual-material structure; heterojunction power Schottky rectifiers; high-temperature power rectifier; low-temperature semiconductor growth; molecular beam epitaxy technique; off-state leakage current; on-state resistance; thermal stability;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20064437
