• DocumentCode
    893139
  • Title

    RF method for determining the sheath thickness in a plasma

  • Author

    Basu, Joyanta ; Sen, Chitradeep

  • Volume
    55
  • Issue
    10
  • fYear
    1967
  • Firstpage
    1767
  • Lastpage
    1767
  • Abstract
    The letter presents an RF method for determining the sheath thickness of a plane probe immersed in a plasma and biased with a dc voltage. Expressions are derived giving the sheath thickness in terms of the RF impedance of the probe for different regions of the V - iecharacteristic.
  • Keywords
    Electrons; Impedance measurement; Plasma confinement; Plasma measurements; Plasma properties; Plasma sheaths; Probes; Radio frequency; Resonance; Voltage;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IEEE
  • Publisher
    ieee
  • ISSN
    0018-9219
  • Type

    jour

  • DOI
    10.1109/PROC.1967.5997
  • Filename
    1447927
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=893139