DocumentCode :
895477
Title :
Ionization of SiO2 by Heavy Charged Particles
Author :
Oldham, T.R. ; McGarrity, J.M.
Author_Institution :
U.S. Army Electronics Research and Development Command Harry Diamond Laboratories Adelphi, MD
Volume :
28
Issue :
6
fYear :
1981
Firstpage :
3975
Lastpage :
3980
Abstract :
Highly ionizing heavy charged particles generate significant charge as they pass through the thin thermally grown gate oxide of a MOSFET device. The amount of charge created by an alpha particle and proton is calculated and the yield of charqes which escape initial recombination is measured. The experimental results are shown to agree with a charge recombination model where an ionization track radius of 30-40 Ã… is assumed. Finally, implications of the findings for single charged particle effects in submicron dimension devices are discussed.
Keywords :
Alpha particles; Bonding; Contacts; Electrodes; Ionization; MOS capacitors; MOSFET circuits; Protons; Spontaneous emission; Temperature;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1981.4335658
Filename :
4335658
Link To Document :
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