DocumentCode
895477
Title
Ionization of SiO2 by Heavy Charged Particles
Author
Oldham, T.R. ; McGarrity, J.M.
Author_Institution
U.S. Army Electronics Research and Development Command Harry Diamond Laboratories Adelphi, MD
Volume
28
Issue
6
fYear
1981
Firstpage
3975
Lastpage
3980
Abstract
Highly ionizing heavy charged particles generate significant charge as they pass through the thin thermally grown gate oxide of a MOSFET device. The amount of charge created by an alpha particle and proton is calculated and the yield of charqes which escape initial recombination is measured. The experimental results are shown to agree with a charge recombination model where an ionization track radius of 30-40 Ã
is assumed. Finally, implications of the findings for single charged particle effects in submicron dimension devices are discussed.
Keywords
Alpha particles; Bonding; Contacts; Electrodes; Ionization; MOS capacitors; MOSFET circuits; Protons; Spontaneous emission; Temperature;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1981.4335658
Filename
4335658
Link To Document