• DocumentCode
    895477
  • Title

    Ionization of SiO2 by Heavy Charged Particles

  • Author

    Oldham, T.R. ; McGarrity, J.M.

  • Author_Institution
    U.S. Army Electronics Research and Development Command Harry Diamond Laboratories Adelphi, MD
  • Volume
    28
  • Issue
    6
  • fYear
    1981
  • Firstpage
    3975
  • Lastpage
    3980
  • Abstract
    Highly ionizing heavy charged particles generate significant charge as they pass through the thin thermally grown gate oxide of a MOSFET device. The amount of charge created by an alpha particle and proton is calculated and the yield of charqes which escape initial recombination is measured. The experimental results are shown to agree with a charge recombination model where an ionization track radius of 30-40 Ã… is assumed. Finally, implications of the findings for single charged particle effects in submicron dimension devices are discussed.
  • Keywords
    Alpha particles; Bonding; Contacts; Electrodes; Ionization; MOS capacitors; MOSFET circuits; Protons; Spontaneous emission; Temperature;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1981.4335658
  • Filename
    4335658