DocumentCode
898016
Title
Read and write characteristics of Co-Ni-Zr-M/Cr thin films for longitudinal recording
Author
Shiroishi, Y. ; Matsuda, Y. ; Hishiyama, S. ; Suzuki, H. ; Ohno, T. ; Yahisa, Y.
Author_Institution
Hitachi Ltd., Tokyo, Japan
Volume
25
Issue
5
fYear
1989
fDate
9/1/1989 12:00:00 AM
Firstpage
3390
Lastpage
3392
Abstract
The magnetic and crystallographic properties and read and write characteristics of sputtered C/Co-Ni-Zr/Cr and C/Co-Ni-Zr-M/Cr (M=V, Nb, Ta, Cr, Mo, W, Cu, Si, Al, Ru and Pt) thin films are investigated. The saturation magnetic flux density B s of all C/Co-Ni-Zr-M/Cr films decreases as the amount of additive element increases. The coercivity of C/Co-Ni-Zr-Cr/Cr and C/Co-Ni-Zr-Pt/Cr is higher than that of C/Co-Ni-Zr/Cr films with comparable B s . The larger the perpendicular anisotropy K p and the smaller the anisotropy constant K n, the lower the media noise N and the higher the S /N ratio. The reduction of K n and N are strongly connected to grain separation and grain size reduction. The larger the B s·t mag, the higher E II and N and the lower D 50 and the S /N ratio. All films except those with Si, Ru, and Pt additives have large K p, a small K n, and a high S /N ratio. In particular, C/Co-Ni-Zr-M/Cr (M=Cr, Mo, W, and Al) disks have a better S /N ratio and D 50 than C/Co-Ni-Zr/Cr disks
Keywords
aluminium alloys; carbon; chromium; chromium alloys; cobalt alloys; coercive force; copper alloys; magnetic anisotropy; magnetic disc storage; magnetic recording; magnetic thin films; nickel alloys; niobium alloys; platinum alloys; ruthenium alloys; silicon alloys; sputtered coatings; tantalum alloys; tungsten alloys; vanadium alloys; zirconium alloys; C-CoNiZr-Cr; C-CoNiZrAl-Cr; C-CoNiZrCr-Cr; C-CoNiZrCu-Cr; C-CoNiZrMo-Cr; C-CoNiZrNb-Cr; C-CoNiZrPt-Cr; C-CoNiZrRu-Cr; C-CoNiZrSi-Cr; C-CoNiZrTa-Cr; C-CoNiZrV-Cr; C-CoNiZrW-Cr; anisotropy constant; coercivity; crystallographic properties; disc storage; grain separation; grain size; longitudinal recording; perpendicular anisotropy; read characteristics; saturation magnetic flux density; sputtered thin film; write characteristics; Anisotropic magnetoresistance; Chromium; Crystallography; Magnetic films; Magnetic flux; Magnetic properties; Magnetic separation; Saturation magnetization; Sputtering; Transistors;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.42311
Filename
42311
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