DocumentCode :
898866
Title :
Modeling the critical area in yield forecasts
Author :
Ferris-Prabhu, A.V.
Volume :
20
Issue :
4
fYear :
1985
fDate :
8/1/1985 12:00:00 AM
Firstpage :
874
Lastpage :
878
Abstract :
Semiconductor device yield is determined primarily by the defect density and the critical area, i.e., that portion of the circuit active area in which the occurrence of a defect results in yield loss. A mathematical theory is developed for fault probability and critical area in terms of device geometry and defect size distribution. Equations are derived for its computation for different geometries, and the physical significance of the parameters contained in the equations is discussed.
Keywords :
Fault location; Monolithic integrated circuits; fault location; monolithic integrated circuits; Charge carrier processes; Circuit faults; Computational geometry; Electrons; Information geometry; Insulation; MOSFET circuits; Metal-insulator structures; Predictive models; Semiconductor devices;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.1985.1052403
Filename :
1052403
Link To Document :
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