DocumentCode
898866
Title
Modeling the critical area in yield forecasts
Author
Ferris-Prabhu, A.V.
Volume
20
Issue
4
fYear
1985
fDate
8/1/1985 12:00:00 AM
Firstpage
874
Lastpage
878
Abstract
Semiconductor device yield is determined primarily by the defect density and the critical area, i.e., that portion of the circuit active area in which the occurrence of a defect results in yield loss. A mathematical theory is developed for fault probability and critical area in terms of device geometry and defect size distribution. Equations are derived for its computation for different geometries, and the physical significance of the parameters contained in the equations is discussed.
Keywords
Fault location; Monolithic integrated circuits; fault location; monolithic integrated circuits; Charge carrier processes; Circuit faults; Computational geometry; Electrons; Information geometry; Insulation; MOSFET circuits; Metal-insulator structures; Predictive models; Semiconductor devices;
fLanguage
English
Journal_Title
Solid-State Circuits, IEEE Journal of
Publisher
ieee
ISSN
0018-9200
Type
jour
DOI
10.1109/JSSC.1985.1052403
Filename
1052403
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