• DocumentCode
    898866
  • Title

    Modeling the critical area in yield forecasts

  • Author

    Ferris-Prabhu, A.V.

  • Volume
    20
  • Issue
    4
  • fYear
    1985
  • fDate
    8/1/1985 12:00:00 AM
  • Firstpage
    874
  • Lastpage
    878
  • Abstract
    Semiconductor device yield is determined primarily by the defect density and the critical area, i.e., that portion of the circuit active area in which the occurrence of a defect results in yield loss. A mathematical theory is developed for fault probability and critical area in terms of device geometry and defect size distribution. Equations are derived for its computation for different geometries, and the physical significance of the parameters contained in the equations is discussed.
  • Keywords
    Fault location; Monolithic integrated circuits; fault location; monolithic integrated circuits; Charge carrier processes; Circuit faults; Computational geometry; Electrons; Information geometry; Insulation; MOSFET circuits; Metal-insulator structures; Predictive models; Semiconductor devices;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/JSSC.1985.1052403
  • Filename
    1052403