A utility-based integrated system for process simulation

Author

Scheckler, Edward W. ; Wong, Alexander S. ; Wang, Robert H. ; Chin, Goodwin ; Camagna, John R. ; Neureuther, Andrew R. ; Dutton, Robert W.

Author_Institution

Electron. Res. Lab., California Univ., Berkeley, CA, USA

Volume

11

Issue

7

fYear

1992

fDate

7/1/1992 12:00:00 AM

Firstpage

911

Lastpage

920

Abstract

An integrated process simulation system which uses functional utilities to integrate disparate 2-D simulation tools is described. The software utilities provide mechanisms for simulator input generation and user interaction, for mapping between different cross-section formats, and for output visualization. The specific utilities are described. With this approach, several process simulators for lithography, etching, deposition, and thermal processing have been integrated into a unified system, SIMPL-IPX (simulation of profiles from the layout-integrated process simulation environment with X-Windows). Simulation examples for metal l planarization, bipolar technology with a polysilicon , collector 5 plug, and advanced lithography are presented to demonstrated 7 the usefulness of this approach to technology CAD tool 8 integration. Methods for improved data management using 9 a CAD framework are described

Keywords

bipolar integrated circuits; digital simulation; semiconductor device models; semiconductor technology; CAD framework; CAD tool 8 integration; SIMPL-IPX; X-Windows; bipolar technology; cross-section formats; data management; deposition; etching; input generation; integrated process simulation system; layout-integrated process simulation; lithography; metal l planarization; output visualization; polysilicon , collector 5 plug; process simulation; process simulators; simulation of profiles; software utilities; thermal processing; unified system; user interaction; utility-based integrated system; Circuit simulation; Etching; Helium; Integrated circuit technology; Laboratories; Lithography; Modems; Planarization; Plugs; Visualization;

fLanguage

English

Journal_Title

Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on

Publisher

ieee

ISSN

0278-0070

Type

jour

DOI

10.1109/43.144855

Filename

144855