DocumentCode :
899434
Title :
A utility-based integrated system for process simulation
Author :
Scheckler, Edward W. ; Wong, Alexander S. ; Wang, Robert H. ; Chin, Goodwin ; Camagna, John R. ; Neureuther, Andrew R. ; Dutton, Robert W.
Author_Institution :
Electron. Res. Lab., California Univ., Berkeley, CA, USA
Volume :
11
Issue :
7
fYear :
1992
fDate :
7/1/1992 12:00:00 AM
Firstpage :
911
Lastpage :
920
Abstract :
An integrated process simulation system which uses functional utilities to integrate disparate 2-D simulation tools is described. The software utilities provide mechanisms for simulator input generation and user interaction, for mapping between different cross-section formats, and for output visualization. The specific utilities are described. With this approach, several process simulators for lithography, etching, deposition, and thermal processing have been integrated into a unified system, SIMPL-IPX (simulation of profiles from the layout-integrated process simulation environment with X-Windows). Simulation examples for metal l planarization, bipolar technology with a polysilicon , collector 5 plug, and advanced lithography are presented to demonstrated 7 the usefulness of this approach to technology CAD tool 8 integration. Methods for improved data management using 9 a CAD framework are described
Keywords :
bipolar integrated circuits; digital simulation; semiconductor device models; semiconductor technology; CAD framework; CAD tool 8 integration; SIMPL-IPX; X-Windows; bipolar technology; cross-section formats; data management; deposition; etching; input generation; integrated process simulation system; layout-integrated process simulation; lithography; metal l planarization; output visualization; polysilicon , collector 5 plug; process simulation; process simulators; simulation of profiles; software utilities; thermal processing; unified system; user interaction; utility-based integrated system; Circuit simulation; Etching; Helium; Integrated circuit technology; Laboratories; Lithography; Modems; Planarization; Plugs; Visualization;
fLanguage :
English
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
0278-0070
Type :
jour
DOI :
10.1109/43.144855
Filename :
144855
Link To Document :
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