DocumentCode :
900358
Title :
GaAs on Si-the ultimate wafer?
Author :
Dettmer, Roger
Volume :
35
Issue :
4
fYear :
1989
fDate :
4/20/1989 12:00:00 AM
Firstpage :
136
Lastpage :
137
Abstract :
There are two basic reasons why growing GaAs on Si could be worthwhile. First, it could provide a low-cost, robust source of GaAs wafers. Growing single crystals of GaAs is relatively difficult, and GaAs wafers are generally smaller and more expensive than their silicon counterparts. They are also more fragile and prone to breakage. Secondly, it would allow high-speed digital Si, high-frequency analogue GaAs and the interchip connections to be integrated on a single substrate. The author discusses the defect densities of the GaAs layer due to lattice mismatch and then describes how the problem can be overcome by using strained layer superlattices grown by MOVPE
Keywords :
III-V semiconductors; elemental semiconductors; gallium arsenide; integrated circuit technology; semiconductor growth; semiconductor superlattices; silicon; vapour phase epitaxial growth; MOVPE; defect densities; interchip connections; lattice mismatch; strained layer superlattices; wafer;
fLanguage :
English
Journal_Title :
IEE Review
Publisher :
iet
ISSN :
0953-5683
Type :
jour
Filename :
215649
Link To Document :
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