DocumentCode :
901341
Title :
Ionizing Radiation Effects on Power MOSFETS during High Speed Switching
Author :
Blackburn, D.L. ; Berning, D.W. ; Benedetto, J.M. ; Galloway, K.F.
Author_Institution :
Semiconductor Devices and Circuits Division, National Bureau of Standards, Washington, DC 20234
Volume :
29
Issue :
6
fYear :
1982
Firstpage :
1555
Lastpage :
1558
Abstract :
Data on the effects of gamma radiation on the electrical characteristics of power VDMOS transistors are presented. The devices were exposed to radiation while the gate voltage was switching at 100 kHz or while held at a dc voltage. Several drain voltage configurations were also explored. The threshold voltage shifts observed begin to saturate at relatively low doses (~0.1 Mrad(Si)) for all but the worst case bias (VG = +10 V). The threshold voltage shifts do not show significant dependence on drain voltage. The devices studied appear to be approximately an order of magnitude more efficient in trapping radiation generated holes than would be expected in a state-of-the-art radiation hardened planar MOSFET.
Keywords :
Bipolar transistors; Electric variables; FETs; Gamma rays; Ionizing radiation; MOSFETs; Power semiconductor switches; Radiation hardening; Satellites; Threshold voltage;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1982.4336403
Filename :
4336403
Link To Document :
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