DocumentCode :
901348
Title :
The Effect of Operating Conditions on the Radiation Resistance of VDMOS Power FETs
Author :
Seehra, S.S. ; Slusark, W.J., Jr.
Author_Institution :
RCA Astro Electronics, Princeton, NJ 08540
Volume :
29
Issue :
6
fYear :
1982
Firstpage :
1559
Lastpage :
1563
Abstract :
The effect of gamma radiation on the threshold voltage, "On" resistance, and breakdown voltage of VDMOS Field Effect Transistors operating under various bias conditions is presented. The drain-source breakdown voltage and the "On" resistance of these devices have been found to be unaffected by irradiating the devices to a total dose of 4×104 rads. The electrical parameter affected by irradiation is the gate threshold voltage. The threshold voltage shift at a particular radiation level for devices biased with both gate and drain voltage has been determined to be dependent only on the magnitude of the gate voltage during irradiation. This shift has been found to be independent of the drain-source voltage (30-80 volt range) and operating frequency (10-50kHz range). Practically no annealing occurs at room temperature. However, these devices have been found to recover to within 10% of their initial threshold voltage after annealing at 200°C under gate bias of 18 volts for 22 hours.
Keywords :
Annealing; Artificial satellites; Electric resistance; FETs; Frequency; Ionization; Ionizing radiation; Temperature; Testing; Threshold voltage;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1982.4336404
Filename :
4336404
Link To Document :
بازگشت