DocumentCode :
901568
Title :
Temperature Effects on Failure and Annealing Behavior in Dynamic Random Access Memories
Author :
Wilkin, Neil D. ; Self, Charles T.
Author_Institution :
U.S. Army Electronics Research and Development Command Harry Diamond Laboratories Adelphi, Maryland 20783
Volume :
29
Issue :
6
fYear :
1982
Firstpage :
1669
Lastpage :
1673
Abstract :
Total dose failure levels and long time anneal characteristics of dynamic random access memories are measured while the devices are exercised under actual use conditions. These measurements were performed over the temperature range of -60 C to +70 C. The total dose failure levels are shown to decrease with increasing temperature. The anneal characteristics are shown to result in both an increase and decrease in the measured number of errors as a function of time. Finaly a description of the test instrumentation and irradiation procedures are given.
Keywords :
Annealing; DRAM chips; Heat transfer; Instruments; Large scale integration; Temperature control; Temperature distribution; Temperature measurement; Testing; Time measurement;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1982.4336425
Filename :
4336425
Link To Document :
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