DocumentCode :
901678
Title :
High speed selfaligned GaInP/GaAs HBBTs
Author :
Leier, H. ; Marten, A. ; Bachem, K.H. ; Pletschen, W. ; Tasker, P.
Author_Institution :
Daimler Benz AG, Ulm, Germany
Volume :
29
Issue :
10
fYear :
1993
fDate :
5/13/1993 12:00:00 AM
Firstpage :
868
Lastpage :
870
Abstract :
High speed selfaligned Ga0.5In0.5P/GaAs hole barrier bipolar transistors (HBBTs) with a 60 nm carbon doped base layer (p=6.5*1019 cm-3) and a 20 nm undoped GaInP barrier have been fabricated. The devices show maximum small signal current gains around 30, independent of emitter size. A current gain cutoff frequency of fT=95 GHz and power gain cutoff frequency of fmax=110 GHz are reported for 1.5*10 mu m2 and 2*1.5*10 mu m2 devices, respectively. These results represent the best microwave performance yet reported for Ga0.5In0.5P/GaAs based HBTs.
Keywords :
III-V semiconductors; gallium arsenide; gallium compounds; heterojunction bipolar transistors; indium compounds; solid-state microwave devices; 110 GHz; 95 GHz; C doped base layer; Ga 0.5In 0.5P-GaAs:C; HBBTs; HBTs; bipolar transistors; current gain cutoff frequency; high speed selfaligned device; hole barrier; microwave performance; power gain cutoff frequency; undoped GaInP barrier;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19930580
Filename :
216279
Link To Document :
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