Title :
Characterization of current-induced degradation in Be-doped HBTs based in GaAs and InP
Author :
Tanaka, Shin-ichi ; Shimawaki, Hidenori ; Kasahara, Kensuke ; Honjo, Kazuhiko
Author_Institution :
NEC Corp., Ibaraki, Japan
fDate :
7/1/1993 12:00:00 AM
Abstract :
The changes in the device characteristics under high-bias conditions are investigated for InAlAs/InGaAs and AlGaAs/GaAs heterojunction bipolar transistors (HBTs) with heavily Be-doped base lasers, focusing on the base current and 1/f noise characteristics. It is shown that the ideality factor of the surface recombination base current provides information on the Be movement accompanying the degradation. For stress current densities up to 1.5×105 A/cm2, the Be movement in the InAlAs/InGaAs HBTs is estimated to be no more than a small fraction of the 5 nm setback layer. The 1/f noise measurement highlight the effect of current stressing on the surface recombination in the HBTs. A characteristic spectral shape is found in the noise spectra for the current-stressed AlGaAs/GaAs HBT, possibly originating from the degradation-induced carrier traps. Although both HBTs have similar electronic properties, these results illustrate the striking difference in their stress current behaviors
Keywords :
III-V semiconductors; aluminium compounds; beryllium; gallium arsenide; heavily doped semiconductors; heterojunction bipolar transistors; indium compounds; random noise; semiconductor device noise; semiconductor device testing; solid-state microwave devices; 1/f noise characteristics; AlGaAs:Be-GaAs; GaAs; HBTs; InAlAs-InGaAs:Be; InP; base current; current stressing; current-induced degradation; degradation-induced carrier traps; heavily Be-doped base lasers; heterojunction bipolar transistors; high-bias conditions; ideality factor; microwave applications; stress current densities; surface recombination; Current density; Degradation; Gallium arsenide; Heterojunction bipolar transistors; Indium compounds; Indium gallium arsenide; Laser noise; Laser transitions; Noise measurement; Stress;
Journal_Title :
Electron Devices, IEEE Transactions on