DocumentCode :
904343
Title :
A means of reducing custom LSI interconnection requirements
Author :
Calhoun, Donald F. ; McNamee, Lawrence P.
Volume :
7
Issue :
5
fYear :
1972
Firstpage :
395
Lastpage :
404
Abstract :
Large-scale integrated circuit interconnect approaches such as pad relocation and discretionary techniques have been developed for interconnecting very large numbers of circuits on monolithic integrated-circuit wafers. Although these approaches were perhaps premature in their original development, considerable interest is currently being shown in full wafer LSI. In order to avoid the defective circuits that naturally occur on such large circuit arrays, it has been necessary to customize each wafer´s interconnection mask to its unique yield pattern. The authors examine in detail a means of using each mask set for perhaps several unique wafers, thus providing important custom routing and mask generation cost savings. In the case of pad relocation, only a single mask then comprises the entire custom mask set for several wafer arrays.
Keywords :
Economics; Large scale integration; Masks; economics; large scale integration; masks; Aircraft; Circuit testing; Cities and towns; Costs; Electron devices; Integrated circuit interconnections; Integrated circuit yield; Large scale integration; Logic circuits; Standardization;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.1972.1052899
Filename :
1052899
Link To Document :
بازگشت