Title :
ArF laser-induced discharge interruption in a mixture of C2 H3Cl/CF4/CH4, CF4/CH 4, and C2H3Cl/He
Author :
Sasagawa, Teruo ; Kawahara, Akihiro ; Obara, Minoru
Author_Institution :
Dept. of Electr. Eng., Keio Univ., Yokohama, Japan
fDate :
2/1/1989 12:00:00 AM
Abstract :
The ArF-laser (193-nm)-induced discharge interruption is comparatively described in a mixture of C2H3Cl/CF 4/CH4, CF4/CH4, and C2 H3Cl/He using a hollow-cathode-type discharge tube. The unfocused ArF laser (typically 27 mJ/cm2 and 10 ns duration) illuminated both the negative glow inside the hollow cathode and the column between the two electrodes. With a 1.8-torr mixture of C2 H3Cl/CF4, the discharge current of 1 mA was decreased rapidly with a current-decay time constant of 1 μs and a current-decay rate of 1 kA/s. With a 1.5-torr mixture of CF4/CH4, 2.2 μs and 450 A/s were obtained. With a 1.5-torr mixture of CH2H3Cl/He, a time constant of over 3 μs and a rate of less than 300 A/s were obtained. An analysis of the discharge interruption induced by ArF-laser irradiation is given in terms of photon-plasma kinetics. The current peak induced by ArF irradiation is also explained for a mixture of C2H3 Cl/He in terms of photoionization and photodetachment processes
Keywords :
argon compounds; discharges (electric); gas mixtures; laser beam effects; molecular photoionisation; organic compounds; plasma kinetic theory; plasma-beam interactions; 1 mA; 1 mus; 1.5 torr; 1.8 torr; 10 ns; 193 nm; 2.2 mus; ArF; chloroethane; current peak; current-decay rate; current-decay time constant; discharge current; electrodes; hollow-cathode-type discharge tube; laser-induced discharge interruption; methane; negative glow; photodetachment processes; photoionization; photon-plasma kinetics; tetrafluoromethane; Cathodes; Electrodes; Electron optics; Electron tubes; Gas lasers; Helium; Optical buffering; Optical control; Optical switches; Plasmas;
Journal_Title :
Plasma Science, IEEE Transactions on
